Semiconductor device full-wave rectifier circuit and half-wave rectifier circuit
AssigneeSanyo Electric Co., Ltd.
InventorsKazutomo Goshima, Hiroshi Saito, Yoshiyuki Fukuda, Tsutomu Nakazawa
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AssigneeSanyo Electric Co., Ltd.
InventorsKazutomo Goshima, Hiroshi Saito, Yoshiyuki Fukuda, Tsutomu Nakazawa
Estimating the term…
Unnecessary leakage current to a semiconductor substrate is prevented when a forward current flows through a diode. An N-type well region is formed in a surface of a P-type semiconductor substrate. A P-type well region is formed in the N-type well region. An N+-type diffusion layer is formed in a surface of the N-type well region outside the P-type well region. A P+-type diffusion layer and an N+-type diffusion layer are formed in a surface of the P-type well region. The N+-type diffusion layer formed in the surface of the N-type well region is electrically connected with the P+-type diffusion layer formed in the surface of the P-type well region with a wiring made of aluminum, for example. An anode electrode is connected with the wiring. Also, a cathode electrode is connected with the N+-type diffusion layer.
A semiconductor device comprising:
A full-wave rectifier circuit comprising:
A half-wave rectifier circuit comprising:
Dependencies are inferred from the claim text.