Removing byproducts of physical and chemical reactions in an ion implanter

The ion implanter wherein the heater substrate comprises electrical conductors for heating the assembly.

A method for use with an ion implanter having an ion source, a workpiece support and a transport system for delivering ions from the ion source to an ion implantation chamber that contains the workpiece support, comprising:

• mounting one or more removable inserts to an interior of either the transport system or the ion implantation chamber for collecting material entering either the transport system or the ion implantation chamber due to collisions between ions and the workpiece within the ion implantation chamber during ion processing of the workpiece, and
• elevating a temperature of the one or more removable inserts to maintain the temperature of the one or more inserts at a controlled temperature to promote formation of a film on said one or more inserts during ion treatment due to collisions between ions and said workpiece.