Partial edge bead removal to allow improved grounding during e-beam mask writing
OwnerJ. Rolfsoninventor
Life of this patent
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Abstract
A method to provide a ground point for second, or subsequent, e-beam mask-writing steps by selectively removing the photoresist edge bead of a photomask substrate to expose the underlying chrome layer. The selective removal leaves at least one tab of photoresist edge bead over the chrome layer. After the first e-beam mask writing step and subsequent etch, the tab can be removed to expose a portion of the chromium layer that can act as a new ground point for a second e-beam etch. Also, a nozzle for use in selectively removing the edge bead to leave a tab of photoresist edge bead.
Claims22
A nozzle tool for removing a material from a workpiece having a top surface and bottom surface and an edge, defining a periphery, connecting the top and bottom surfaces, the tool comprising:
- a first means to apply and remove a solvent for the material, the first means being adapted to apply and remove the solvent to the top surface of the workpiece adjacent to the periphery;
- a second means to apply and remove the solvent, the second means being adapted to apply and remove the solvent to the edge of the workpiece;
- and
- a third means to apply and remove the solvent, the third means being adapted to apply and remove the solvent to the bottom surface of the workpiece adjacent to the periphery,
- wherein each means to apply and remove the solvent may be independently controlled.
A tool configured to remove a layer of material from a photomask plate, wherein the tool comprises:
- a first nozzle configured to apply and remove a solvent to a top surface of the photomask plate;
- a second nozzle configured to apply and remove a solvent from the edge of the photomask plate;
- and
- a third nozzle configured to apply and remove a solvent to the bottom surface of the photomask plate adjacent to the periphery,
- wherein each nozzle may be independently controlled.
A tool configured to remove a layer of material from a photomask plate, wherein the tool comprises:
- a first nozzle and vacuum means configured to apply and remove a solvent to a top surface of the photomask plate;
- a second nozzle and vacuum means configured to apply and remove a solvent from the edge of the photomask plate;
- and
- a third nozzle and vacuum means configured to apply and remove a solvent to the bottom surface of the photomask plate adjacent to the periphery,
- wherein each nozzle may be independently controlled.
A tool configured to remove a layer of material from a photomask plate, wherein the tool comprises:
- a first nozzle and vacuum means configured to apply and remove a solvent to a top surface of the photomask plate;
- a second nozzle configured to apply and remove a solvent from the edge of the photomask plate;
- and
- a third nozzle configured to apply and remove a solvent to the bottom surface of the photomask plate adjacent to the periphery,
- wherein each nozzle may be independently controlled.
A tool configured to remove a layer of material from a photomask plate, wherein the tool comprises:
- a first nozzle and vacuum means configured to apply and remove a solvent to a top surface of the photomask plate;
- a second nozzle and vacuum means configured to apply and remove a solvent from the edge of the photomask plate;
- and
- a third nozzle configured to apply and remove a solvent to the bottom surface of the photomask plate adjacent to the periphery,
- wherein each nozzle may be independently controlled.
A nozzle tool for removing a material from a workpiece having a top surface and bottom surface and an edge, defining a periphery, connecting the top and bottom surfaces, the tool comprising:
- a first nozzle and vacuum means adapted to apply and remove a solvent to the top surface of the workpiece adjacent to the periphery;
- a second nozzle and vacuum means adapted to apply and remove a solvent to the edge of the workpiece;
- a third nozzle and vacuum means adapted to apply and remove a solvent to the bottom surface of the workpiece adjacent to the periphery,
- wherein each nozzle is independently controlled by means of a control valve.
A photomask layer removal tool configured to remove a photoresist layer from the photomask, wherein the tool comprises:
- a top, and a bottom and a side, connected to the top and bottom, wherein the tool is configured to surround the photomask without touching the photomask;
- a nozzle and vacuum means configured to apply and remove a solvent to a surface of the photomask plate.
A tool configured to remove a layer of material from a photomask plate, wherein the tool comprises:
- a top, and a bottom and a side, connected to the top and bottom, wherein the tool is configured to surround the photomask without touching the photomask;
- and
- a nozzle and vacuum means, wherein the tool is capable of removing an edge bead from a photomask plate.
A nozzle tool for removing a material from a workpiece having a top surface and bottom surface and an edge, defining a periphery, connecting the top and bottom surfaces, the tool comprising:
- a first means to apply and remove a solvent for the material, the first means being adapted to apply and remove the solvent to the top surface of the workpiece adjacent to the periphery;
- a second means to apply and remove the solvent, the second means being adapted to apply and remove the solvent to the edge of the workpiece;
- and
- a third means to apply and remove the solvent, the third means being adapted to apply and remove the solvent to the bottom surface of the workpiece adjacent to the periphery.
A tool configured to remove a layer of material from a photomask plate, wherein the tool comprises:
- a top, and a bottom and a side, connected to the top and bottom, wherein the tool is configured to surround the photomask without touching the photomask;
- and
- a nozzle and vacuum means integral to the tool,
- wherein the tool is configured to apply and remove a solvent selectively to the top surface, bottom surface and edge to dissolve a material from portions of the photomask adjacent to the periphery to expose a chrome layer of the photomask while leaving at least one tab of photoresist material covering the chrome layer adjacent to the periphery.
A nozzle tool for removing a material from a workpiece having a top surface and bottom surface and an edge, defining a periphery, connecting the top and bottom surfaces, the tool comprising:
- a nozzle to apply and remove a solvent for the material,
- wherein the tool is capable of applying and removing a solvent selectively to the top surface, bottom surface and edge to dissolve a photoresist material from portions of the workpiece adjacent to the periphery to expose a chrome layer while leaving at least one tab of the photoresist material covering the chrome layer adjacent to the periphery.
Dependencies are inferred from the claim text.