Megasonic cleaner having double cleaning probe and cleaning method

A cleaner comprising:

• a cleaning vessel having a bottom where a drain port is formed;
• a rotatable wafer support disposed in the cleaning vessel for supporting a wafer;
• a driver for rotating the wafer;
• a nozzle for supplying a cleaning solution to the wafer;
• a cleaning probe including a first probe for agitating a cleaning solution supplied to an inner area near the center of the wafer using megasonic energy and a second probe for agitating a cleaning solution supplied to an outer area surrounding the inner area of the wafer using megasonic energy;
• and
• a generator including a first probe oscillator for oscillating the first probe and a second probe oscillator for oscillating the second probe.

A cleaning method comprising:

• (a) placing a wafer on a rotatable wafer support;
• (b) rotating the wafer placed on the rotatable wafer support;
• (c) locating at least one of first and second probes on a surface of the wafer, the first probe cleaning an inner area including the center of the wafer and the second probe cleaning an outer area surrounding the inner area of the wafer;
• (d) supplying a cleaning solution to the wafer placed on the rotatable wafer support;
• and
• (e) oscillating at least one of the first and second probes using megasonic energy.