Method and apparatus for imprint pattern replication
AssigneeASML Holding N.V.
InventorHarry Sewell
Life of this patent
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Abstract
Provided is a method and system for imprinting a pattern formed on a surface of an imprint mask into a substrate. A method includes deforming at least one of the surface of the imprint mask and a surface of the substrate to produce a deformed surface having an arc therein. A clamping pressure is applied to bring the deformed surface into intimate contact with the other surface, the applied pressure substantially flattening the deformed surface. The applied clamping pressure is released to separate the two surfaces.
Claims4
A method for imprinting a pattern formed on a surface of an imprint mask into a substrate, the method comprising:
- deforming at least one of the surface of the imprint mask and a surface of the substrate to produce a deformed surface having an arc therein;
- applying clamping pressure to bring the deformed surface into intimate contact with the other surface, the applied pressure substantially flattening the deformed surface;
- and
- releasing the applied clamping pressure.
An apparatus for imprinting a pattern formed on a surface of an imprint mask into a substrate, the apparatus comprising:
- means for deforming at least one of the surface of the imprint mask and a surface of the substrate to produce a deformed surface having an arc therein;
- means for applying clamping pressure to bring the deformed surface into intimate contact with the other surface, the applied pressure substantially flattening the deformed surface;
- and
- means for releasing the applied clamping pressure.
Dependencies are inferred from the claim text.