Loading patent…
AssigneeJapan Pionics Co., Ltd.
InventorsYukichi Takamatsu, Kazuaki Tonari, Mitsuhiro Iwata, Koji Kiriyama, Akira Asano
Estimating the term…
The present invention provides a vaporizer having a vaporization chamber for a CVD material, a CVD material feed portion supplying the CVD material for the vaporization chamber, a vaporized gas exhaust port and a heater for heating the vaporization chamber, wherein the CVD material feed portion has passageways for the CVD material and for a carrier gas respectively and the passageway for the CVD material has a pressure loss inducer for the CVD material. At the same time, the present invention provides an apparatus for vaporizing and supplying that feeds a CVD material to a vaporizer via a liquid flow controller, and after vaporizing the CVD material that supplies the vaporized gas for a semiconductor production apparatus having a pressure loss-inducer for the CVD material between the liquid flow controller and the vaporizer. According to the present invention, even in the case of vaporizing and supplying with a decrease in a feed amount of a carrier gas to be supplied accompanying the CVD material employing a solid CVD material, reducing and stabilizing both the pressure fluctuation in the vaporizer and the flow rate fluctuation in the liquid flow controller and efficiently vaporizing a CVD material at a desirable concentration and flow rate without causing deposit or adhesion of the solid material in the vaporization chamber can be achieved.
A vaporizer which comprises a vaporization chamber for a CVD material, a CVD material feed portion supplying said CVD material for said vaporization chamber, a vaporized gas exhaust port and a heating means for heating said vaporization chamber,
An apparatus for vaporizing and supplying that feeds a CVD material to a vaporizer via a liquid flow controller, and after vaporizing said CVD material that supplies a vaporized gas for a semiconductor production apparatus, comprising a pressure loss-inducing means for said CVD material between said liquid flow controller and said vaporizer,
An apparatus for vaporizing and supplying that feeds a CVD material to a vaporizer via a liquid flow controller, and after vaporizing said CVD material that supplies a vaporized gas for a semiconductor production apparatus, comprising a pressure loss-inducing means for said CVD material between said liquid flow controller and said vaporizer,
A vaporizer which comprises a vaporization chamber for a CVD material, a CVD material feed portion supplying said CVD material for said vaporization chamber, and a vaporized gas exhaust port and a heating means for heating said vaporization chamber,
An apparatus for vaporizing and supplying that feeds a CVD material to a vaporizer via a liquid flow controller, and after vaporizing said CVD material that supplies vaporized gas for a semiconductor production apparatus, comprising a pressure loss-inducing means for said CVD material between said liquid flow controller and said vaporizer,
An apparatus for vaporizing and supplying that feeds a CVD material to a vaporizer via a liquid flow controller, and after vaporizing said CVD material that supplies vaporized gas for a semiconductor production apparatus, comprising a pressure loss-inducing means for said CVD material between said liquid flow controller and said vaporizer,
Dependencies are inferred from the claim text.