Polishing pad conditioner with shaped abrasive patterns and channels

(canceled)

(canceled)

(canceled)

A polishing pad conditioner comprising:

• (a) a base;
• and
• (b) a conditioning face on the base, the conditioning face comprising a plurality of abrasive arcs spaced apart by non-abrasive strips, the abrasive arcs comprising at least a first set of arcs at a first radial distance R1 from the center of the conditioning face, and a second set of arcs at a second radial distance R2 from the center of the conditioning face, the abrasive arcs being separated by a ΔR of 0.125 R, where R is the radius of the conditioning face.

(canceled)

A polishing pad conditioner comprising:

• (a) a base;
• and
• (b) a conditioning face on the base, the conditioning face comprising an array of abrasive squares that are spaced apart from one another and located in a non-abrasive grid, the abrasive squares comprising abrasive particles such that at least about 80% of the abrasive particles have crystalline structures with substantially the same crystal symmetry.

(canceled)