Method for microstructuring flat glass substrates

A method for microstructuring flat glass substrates, said method comprising the steps of:

• a) coating a substrate surface of a flat glass substrate with at least one structured mask layer;
• b) mixing a chemical etching gas with at least one noble gas in a mixture ratio of the chemical etching gas to the at least one noble gas of from 2:1 to 6:1 in order to form an etching gas mixture;
• and
• c) performing a chemically reactive ion etching process in which the substrate surface coated with the at least one structured mask layer is exposed to the etching gas mixture;
• wherein the proportion of sputtering etching occurring in the ion etching process is significantly increased by the presence of the at least one noble gas in the etching gas mixture but a major portion of the etching gas mixture consists of the chemical etching gas.