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US 2006/0078807 A1Published application
Lithographic mask alignment
AssigneeHewlett-Packard Development Company, L.P.
InventorYong Chen
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Abstract
Systems and methods of aligning a lithographic mask are described. In one aspect, a substrate and a lithographic mask are aligned based at least in part on a motive force between a substrate alignment mark on the substrate and a mask alignment mark on the lithographic mask that induces movement of at least one of the substrate and the lithographic mask into mutual alignment.
Claims25
A lithographic method, comprising:
- aligning a substrate and a lithographic mask based at least in part on a motive force between a substrate alignment mark on the substrate and a mask alignment mark on the lithographic mask inducing movement of at least one of the substrate and the lithographic mask into mutual alignment.
A lithographic system, comprising:
- a capacitive coupling based alignment system electrically connected to a substrate alignment mark on a substrate and a mask alignment mark on a lithographic mask and configured to generate between the substrate alignment mark and the mask alignment mark a motive force inducing movement of at least one of the substrate and the lithographic mask into mutual alignment.
A lithographic system, comprising:
- a lithographic mask comprising:
- a surface relief pattern exposed for imprinting a corresponding surface relief pattern into a thin film on a substrate;
- a first alignment mark comprising an electrically conducting element having a capacitive coupling region arranged for capacitive coupling with a corresponding alignment mark on the substrate;
- and
- a second alignment mark comprising an electrically conducting element having a capacitive coupling region arranged for capacitive coupling with a corresponding alignment mark on the substrate;
- wherein the capacitive coupling region of the first alignment mark is larger than the capacitive coupling region of the second alignment mark.
3 more elements
A lithographic system, comprising:
- a lithographic mask comprising a surface relief pattern exposed for imprinting a corresponding surface relief pattern into a thin film on a substrate, and at least one magnetically polarized alignment mark.
Dependencies are inferred from the claim text.