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US 2006/0078637 A1Published application
Solid immersion lens lithography
AssigneeGlobalfoundries Inc.
InventorsRama Goruganthu, Michael Bruce
Life of this patent
Estimating the term…
Abstract
Lithography using solid immersion lenses is disclosed. In one aspect, an apparatus is provided that includes a resist film that has a first side and a second and opposite side. One or more solid immersion lenses are positioned over the first side of the resist film. In another aspect, a method of manufacturing is provided that includes forming a resist film and exposing the resist film with radiation transmitted through one or more solid immersion lenses.
Claims108
An apparatus, comprising:
- a resist film having a first side and a second and opposite side;
- and
- one or more solid immersion lenses positioned over the first side of the resist film.
An apparatus, comprising:
- an exposure mask;
- a source of radiation to illuminate the exposure mask;
- one or more solid immersion lenses positioned beneath the exposure mask to focus radiation transmitted through the exposure mask;
- and
- a member for holding the one or more of solid immersion lenses.
2 more elements
An apparatus, comprising:
- a circuit device;
- a resist film positioned on the circuit device;
- an exposure mask positioned above the resist film;
- a source of radiation to illuminate the exposure mask;
- one or more solid immersion lenses positioned between the exposure mask and the resist film to focus radiation transmitted through the exposure mask in the resist film;
- and
- a member for holding the one or more of solid immersion lenses.
4 more elements
An apparatus, comprising:
- a circuit device;
- a resist film positioned on the circuit device;
- an exposure mask positioned above the resist film;
- a source of radiation to illuminate the exposure mask;
- an array of solid immersion lenses coupled to the resist film to focus radiation transmitted through the exposure mask in the resist film;
- and
- a member for holding the circuit device.
4 more elements
A method of manufacturing, comprising:
- forming a resist film;
- and
- exposing the resist film with radiation transmitted through one or more solid immersion lenses.
A method of manufacturing, comprising:
- forming a resist film;
- and
- forming one or more solid immersion lenses on the resist film.
A mask, comprising:
- a plate capable of transmitting electromagnetic radiation, the plate including at least one solid immersion lens;
- and
- an opaque film on the plate, the opaque film being operable to allow transmission of the electromagnetic radiation through the at least one solid immersion lens but prevent transmission of the electromagnetic radiation through at least a portion of the plate.
An apparatus, comprising:
- a source of electromagnetic radiation;
- and
- mask for passing selected portions of the electromagnetic radiation, the mask including a plate capable of transmitting electromagnetic radiation, the plate including at least one solid immersion lens and an opaque film on the plate, the opaque film being operable to allow transmission of the electromagnetic radiation through the at least one solid immersion lens but prevent transmission of the electromagnetic radiation through at least a portion of the plate.
The apparatus of claim 82, wherein the opaque film comprises chrome.
An apparatus, comprising:
- a circuit device;
- a resist film positioned on the circuit device;
- a source of electromagnetic radiation;
- and
- a mask positioned between the source of electromagnetic radiation and the resist film for passing selected portions of the electromagnetic radiation to the resist film, the mask including a plate capable of transmitting electromagnetic radiation, the plate including at least one solid immersion lens and an opaque film on the plate, the opaque film being operable to allow transmission of the electromagnetic radiation through the at least one solid immersion lens but prevent transmission of the electromagnetic radiation through at least a portion of the plate.
2 more elements
A method of manufacturing, comprising:
- forming a resist film;
- and
- exposing the resist film with radiation transmitted through a mask including a plate capable of transmitting electromagnetic radiation, the plate including at least one solid immersion lens and an opaque film on the plate, the opaque film being operable to allow transmission of the electromagnetic radiation through the at least one solid immersion lens but prevent transmission of the electromagnetic radiation through at least a portion of the plate.
A method of manufacturing, comprising:
- forming at least one solid immersion lense on a plate capable of transmitting electromagnetic radiation;
- and
- forming an opaque film on the plate, the opaque film being operable to allow transmission of the electromagnetic radiation through the at least one solid immersion lens but prevent transmission of the electromagnetic radiation through at least a portion of the plate.
Dependencies are inferred from the claim text.