Exposure method and apparatus, and device manufacturing method

An exposure method of exposing a substrate arranged on a movable stage to light through an original and a projection optical system, said method comprising steps of:

• a first measurement of measuring positions of a plurality of reference marks on the movable stage by using a first measurement system which sequentially measures the positions of the plurality of reference marks through the projection optical system;
• a first determination of determining a first relationship to approximately obtain the plurality of positions measured in said first measurement step from set positions of the plurality of reference marks;
• a second measurement of measuring the positions of the plurality of reference marks by using a second measurement system which sequentially measures the positions of the plurality of reference marks through an optical system which does not include the projection optical system;
• a second determination of determining a second relationship to approximately obtain the plurality of positions measured in said second measurement step from the set positions of the plurality of reference marks;
• a third measurement of measuring positions of a plurality of marks on the substrate held by the movable stage by using the second measurement system;
• a third determination of determining a third relationship to approximately obtain the plurality of positions measured in said third measurement step from set positions of the plurality of marks on the substrate;
• and
• a calculation of calculating positions of regions on the substrate to be exposed to the light based on set positions of the regions, the third relationship, and a difference between the first and second relationships.

An exposure apparatus for exposing a substrate to light through an original, said apparatus comprising:

• a projection optical system configured to project a pattern of the original onto the substrate;
• a stage configured to hold the substrate and to move;
• a first measurement unit configured to measure a position of a pattern on the substrate and a position of a pattern on said stage, said first measurement unit comprising an optical system which does not comprise said projection optical system;
• and
• a second measurement unit configured to measure the position of the pattern on said stage through said projection optical system,
• wherein the original and the substrate are aligned based on a measurement result by said first measurement unit, a measurement result by said second measurement unit, a drive characteristic of said stage for measurement by said first measurement unit, and a drive characteristic of said stage for measurement by said second measurement unit.

An exposure apparatus for exposing a substrate to light through an original, said apparatus comprising:

• a projection optical system configured to project a pattern of the original onto the substrate;
• a chuck configured to hold the substrate;
• a stage configured to hold said chuck and to move;
• a first measurement unit configured to measure a position of a pattern on the substrate and a position of a pattern on said chuck, said first measurement unit comprising an optical system which does not comprise said projection optical system;
• and
• a second measurement unit configured to measure the position of the pattern on said chuck through said projection optical system,
• wherein the original and the substrate are aligned based on a measurement result by said first measurement unit, a measurement result by said second measurement unit, a drive characteristic of said stage for measurement by said first measurement unit, and a drive characteristic of said stage for measurement by said second measurement unit.

An exposure apparatus for exposing a substrate to light through an original, said apparatus comprising:

• a projection optical system configured to project a pattern of the original onto the substrate;
• a stage configured to hold the substrate and to moves;
• a first measurement unit configured to sequentially measure positions of a plurality of reference marks on said stage through said projection optical system;
• a measurement optical system which does not comprise said projection optical system;
• a second measurement unit configured to sequentially measure any of the positions of the plurality of reference marks and positions of a plurality of marks on the substrate held by said stage through said measurement optical system;
• and
• a processor configured to determine a first relationship to approximately obtain the positions of the plurality of reference marks measured by said first measurement unit from set positions of the plurality of reference marks, to determine a second relationship to approximately obtain the positions of the plurality of reference marks measured by said second measurement unit from the set positions of the plurality of reference marks, to determine a third relationship to approximately obtain the positions of the plurality of marks on the substrate measured by said second measurement unit from set positions of the plurality of marks on the substrate, and to calculate positions of regions on the substrate to be exposed to the light based on set positions of the regions, the third relationship, and a differences between the first and second relationships.