Semiconductor device and manufacturing method thereof
AssigneeRenesas Technology Corp.
InventorsYasuhiro Ido, Takeshi Iwamoto
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Abstract
The present invention provides a semiconductor device comprising: a substrate; a first insulating film formed on a principal surface of the substrate; a second insulating film formed on the first insulating film; a plurality of fuses formed on the second insulating film; and a blocking layer disposed in the first and second insulating films, the blocking layer being formed of a material capable of reflecting laser light irradiated to blow the plurality of fuses. The blocking layer overlaps a region in which the plurality of fuses are formed when viewed from the principal surface of the substrate. The plurality of fuses may be each formed in two or more insulating film layers laminated to one another on the second insulating film.
Claims7
A semiconductor device comprising:
- a substrate;
- a first insulating film formed on a principal surface of said substrate;
- a second insulating film formed on said first insulating film;
- a fuse insulating film formed on said second insulating film;
- a plurality of fuses formed in said fuse insulating film;
- and
- a blocking layer disposed in said first and second insulating films such that said blocking layer overlaps a region in which said plurality of fuses are formed when viewed from said principal surface of said substrate, said blocking layer being formed of a material capable of reflecting laser light irradiated to blow said plurality of fuses.
A semiconductor device comprising:
- a substrate;
- a third insulating film formed on said substrate;
- a fourth insulating film formed on said third insulating film;
- and
- a plurality of fuses each disposed in said third and fourth insulating films.
A method for manufacturing a semiconductor device, comprising steps of:
- forming a first insulating film on a principal surface of a substrate;
- forming a second insulating film on said first insulating film;
- forming a blocking layer in said first and said second insulating films;
- forming a fuse insulating film on said second insulating film in which said blocking layer is formed;
- and
- forming said plurality of fuses in said fuse insulating film, wherein
- said blocking layer is formed of a material capable of reflecting laser light irradiated to blow said plurality of fuses;
- and
- a region in which said plurality of fuses are formed overlaps a region in which said blocking layer is formed when viewed from said principal surface of said substrate.
Dependencies are inferred from the claim text.