Electron beam irradiating method and manufacturing method of magnetic recording medium

Abstract

The present invention is to make it possible to form a fine pattern, and improve a recording density on a magnetic recording medium and increase signal intensity. There is provided an electron beam irradiating method which irradiates an electron beam on a resist to perform irradiating using an electron beam irradiating apparatus provided with a moving mechanism which moves a state on which a substrate applied with the resist is put in one horizontal direction, and a rotating mechanism which rotates the stage. The electron beam irradiating method includes: exposing a portion once exposed while changing a deflection amount of the electron beam at least one time in the next round and rounds subsequent thereto, when exposure is performed while a deflection amount of an electron beam is being gradually changed so as to draw a concentric circle for each round.

Dependencies are inferred from the claim text.