Polyethersulfone compositions with high heat and good impact resistance
AssigneeGeneral Electric Company
InventorsDaniel Brunelle, Daniel Steiger
Life of this patent
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Abstract
A polyethersulfone composition is disclosed which comprises structural units derived from a monomer mixture comprising fluorenylidene bisphenol-A and at least 50 mole percent of 4,4′-biphenol based on total moles of diphenolic monomers, wherein the polyethersulfone has a minimum glass transition temperature of 235° C. and a notched Izod impact value of 1 ft-lb/in. as measured by ASTM D256.
Claims32
A polyethersulfone composition comprising structural units I
- wherein R1, R2, and R3 are independently at each occurrence a halogen atom, a nitro group, a cyano group, a C1-C12 aliphatic radical, C3-C12 cycloaliphatic radical, or a C3-C12 aromatic radical;
- n, m, q are independently at each occurrence integers from 0 to 4;
- W is a C3-C20 cycloaliphatic radical or a C3-C20 aromatic radical;
- and wherein said composition comprises greater than 5 mole percent aromatic ether structural units derived from at least one bisphenol having structure II
- wherein R3 is independently at each occurrence a halogen atom, a nitro group, a cyano group, a C1-C12 aliphatic radical, C3-C12 cycloaliphatic radical, or a C3-C12 aromatic radical;
- q is independently at each occurrence an integer from 0 to 4;
- W is a C3-C20 cycloaliphatic radical or a C3-C20 aromatic radical.
A polyethersulfone composition comprising structural units XII
- wherein W is a C3-C20 cycloaliphatic radical or a C3-C20 aromatic radical;
- and wherein said composition comprises greater than 5 mole percent aromatic ether structural units derived from at least one bisphenol having structure XIII
- wherein W is a C3-C20 cycloaliphatic radical or a C3-C20 aromatic radical.
A polyethersulfone composition comprising structural units I
- wherein R1, R2, and R3 are independently at each occurrence a halogen atom, a nitro group, a cyano group, a C1-C12 aliphatic radical, C3-C12 cycloaliphatic radical, or a C3-C12 aromatic radical;
- n, m, q are independently at each occurrence integers from 0 to 4;
- and wherein said composition comprises greater than 5 mole percent aromatic ether structural units derived from at least one bisphenol having structure II
- wherein R3 is independently at each occurrence a halogen atom, a nitro group, a cyano group, a C1-C12 aliphatic radical, C3-C12 cycloaliphatic radical, or a C3-C12 aromatic radical;
- q is independently at each occurrence an integer from 0 to 4;
- and W is selected from the group consisting of structures
A method of preparing a polyethersulfone composition said composition comprising structural units I
- wherein R1, R2, and R3 are independently at each occurrence a halogen atom, a nitro group, a cyano group, a C1-C12 aliphatic radical, C3-C12 cycloaliphatic radical, or a C3-C12 aromatic radical;
- n, m, q are independently at each occurrence integers from 0 to 4;
- W is a C3-C20 cycloaliphatic radical or a C3-C20 aromatic radical;
- and wherein said composition comprises greater than 5 mole percent aromatic ether structural units derived from at least one bisphenol having structure II
- wherein R3 is independently at each occurrence a halogen atom, a nitro group, a cyano group, a C1-C12 aliphatic radical, C3-C12 cycloaliphatic radical, or a C3-C12 aromatic radical;
- q is independently at each occurrence an integer from 0 to 4;
- W is a C3-C20 cycloaliphatic radical or a C3-C20 aromatic radical;
- said method comprising:
- (a) contacting essentially equimolar quantities of dialkali metal salts of at least one bisphenol having structure II with at least one bishalophenylsulfone in a substantially dry solvent, optionally in the presence of a phase transfer catalyst;
- and
- (b) quenching the reaction with an acidic quencher.
Dependencies are inferred from the claim text.