Film forming method

A method of forming a film containing Mo and Si wherein said film is a molybdenum silicide film, comprising:

• a Mo source supply step of supplying one or more Mo chemical compounds selected from the group of the following general formula [I] as a Mo source of said film;
• a decomposition step of decomposing the Mo chemical compounds supplied in said Mo source supply step:
• an Si source supply step of supplying SixH(2x+2), where X is an integer of 1 or more, as an Si source of said film;
• and
• a decomposition step of decomposing the Si chemical compounds supplied in said Si source supply step.
• where R1, R2, R3, R4, or R5 is H or a hydrocarbon group respectively, each which has the same type or a different type.

A method of forming a film containing Mo and N wherein said film is a molybdenum nitride film comprising:

• a Mo source supply step of supplying one or more Mo chemical compounds selected from the group of the following general formula [I] as a Mo source of said film;
• a decomposition step of decomposing the Mo chemical compounds supplied in said Mo source supply step:
• an N source supply step of supplying one or more N chemical compounds selected from the group of ammonia and ammonia producing chemical compounds as an N source of said film;
• and
• a decomposition step of decomposing the N chemical compounds supplied in said N source supply step.
• where R1, R2, R3, R4, or R5 is H or a hydrocarbon group respectively, each which has the same type or a different type.