EUV reticle handling system and method
AssigneeNikon Corporation
InventorsAlton Phillips, Michael Sogard, Douglas Watson
Life of this patent
Estimating the term…
Abstract
An enclosure for protecting at least a pattern side and an opposing side of a reticle is disclosed. The enclosure includes a first and second part that form an enclosure around a reticle to be protected during handling, inspection, storage, and transport. The enclosure in conjunction with a heater and heat sink provides thermophoretic protection of an enclosed reticle.
Claims29
A reticle enclosure comprising:
- a first part comprising a first contact surface;
- and
- a second part comprising a second contact surface:
- wherein the first and second part form an enclosed space between them to enclose a reticle when the first contact surface is in contact with the second contact surface;
- and
- at least one of the first and second part further comprises
- at least one support structure to position a reticle to be enclosed with a gap between the reticle to be enclosed and the first and second part;
- and
- a heater attached to one of the first and second parts and electrically connected to electrical connections on the outside of the enclosure.
A reticle enclosure comprising:
- a first part comprising a first contact surface;
- and
- a second part comprising a second contact surface:
- wherein the first and second part form an enclosed space between them to enclose a reticle when the first contact surface is in contact with the second contact surface;
- and
- at least one of the first and second part further comprises
- at least one support structure to position a reticle to be enclosed with a gap between the reticle to be enclosed and the first and second part;
- and
- one or more optical fiber to direct homogenized light from a laser diode array onto a reticle enclosed with the space.
A thermophoretic protection system for a reticle comprising:
- a reticle to be protected by thermophoresis;
- a reticle enclosure comprising a first and second part;
- a heat sink for each of the first and second part to remove heat;
- at least one heater to heat the reticle;
- and
- a gas between the reticle and the enclosure.
A reticle for use in a thermophoretic protection system comprising:
- a reticle having at least one side wall;
- a resistive heater attached to the at least one side wall;
- and
- electrical contact points to allow electricity to power the resistive heater.
An EUV lithography tool comprising:
- an exposure chamber;
- a reticle stage within the exposure chamber
- a reticle library comprising at least one heat sink having a variable cooling rate to remove heat from at least one reticle enclosure and an electrical power supply connectable to the at least one reticle enclosure;
- and
- a reticle enclosure opening and closing station within the exposure chamber.
A reticle protection system comprising:
- a reticle enclosure that encloses a reticle;
- and
- a reticle protection member having an inner space in which to enclose the reticle enclosure and comprising a securing member which secures the reticle and the reticle enclosure in the inner space.
Dependencies are inferred from the claim text.