Lithographic apparatus, device manufacturing method and computer program product
AssigneeASML Netherlands B.V.
InventorJohannes Klerk
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Abstract
Additional vibrations are added during the exposure of a substrate so that vibrations occurring during exposure of a plurality of areas on the substrate are substantially uniform. This may improve CD uniformity.
Claims20
A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate, the apparatus comprising:
- a substrate table configured to hold a substrate;
- a positioning system configured to position the substrate table;
- a control system configured to control the positioning system to induce additional vibrations in the substrate table in a direction so that exposure of a plurality of areas of the substrate is performed under substantially uniform vibration conditions in that direction.
A device manufacturing method, comprising:
- projecting a patterned beam of radiation onto a substrate;
- and
- while projecting the patterned beam, inducing additional vibrations in the substrate in a direction whereby exposure of a plurality of areas of the substrate is performed under substantially uniform vibration conditions in that direction.
A computer program product comprising program code that, when executed by a computer system forming part of a lithographic apparatus, instructs the computer system to control the apparatus to perform a device manufacturing method, the method comprising:
- projecting a patterned beam of radiation onto a substrate;
- while projecting the patterned beam, inducing additional vibrations in the substrate in a direction whereby exposure of a plurality of areas of the substrate is performed under substantially uniform vibration conditions in that direction.
Dependencies are inferred from the claim text.