Method for electron beam-initiated coating for application of transmission electron microscopy
AssigneeInternational Business Machines Corporation
InventorWei Lu
Life of this patent
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Abstract
A method for preparing a specimen for application of microanalysis thereto includes forming an initial conductive layer over a defined area of interest on a semiconductor substrate, the initial conductive layer formed through an electron beam deposition process. A volume of substrate material surrounding the area of interest is removed, thereby forming the specimen, including said area of interest and said initial conductive layer over the area of interest. The specimen is then removed from the bulk substrate material.
Claims16
A method for preparing a specimen for application of microanalysis thereto, the method comprising:
- forming an initial conductive layer over an area of interest, said initial conductive layer formed through a low-energy beam deposition process;
- removing a volume of material surrounding said area of interest by forming a pair of trenches in a bulk material having said area of interest formed thereon, thereby forming a membrane including said area of interest and said initial conductive layer over said area of interest;
- and
- removing said membrane from said bulk material.
A method for preparing a specimen for application of microanalysis thereto, the method comprising:
- forming an initial conductive layer over a defined area of interest on a semiconductor substrate, said initial conductive layer formed through an electron beam deposition process;
- removing a volume of substrate material surrounding said area of interest, thereby forming the specimen, including said area of interest and said initial conductive layer over said area of interest;
- and
- removing the specimen from said bulk substrate material.
Dependencies are inferred from the claim text.