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US 2006/0065524 A1Published application
Non-bonded rotatable targets for sputtering
OwnerRichard Newcomb, Doug Robinsoninventors
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Abstract
A rotatable target for sputtering is described. This target can include a target backing tube having an exterior surface; a backing layer in contact with the exterior surface of the target backing tube, the backing layer being electrically conductive and thermally non-conductive; and a plurality of target cylinders located around the target backing tube and in contact with the backing layer.
Claims26
A sputtering system comprising:
- a target backing tube having an exterior surface;
- a backing layer in contact with the exterior surface of the target backing tube, the backing layer being electrically conductive and thermally non-conductive;
- and
- a plurality of target cylinders located around the target backing tube and in contact with the backing layer.
1 more element
A sputtering system comprising:
- a plurality of target cylinders having an outer surface and an inner surface;
- and
- a mesh attached to the inner surface of at least some of the plurality of target cylinders, the mesh layer being electrically conductive and thermally non-conductive.
A sputtering system comprising:
- a target backing tube having an exterior surface;
- a separator in contact with the exterior surface of the target backing tube;
- and
- a plurality of target cylinders located around the target backing tube and in contact with the separator.
1 more element
A rotatable magnetron system comprising:
- a target backing tube having an exterior surface;
- a backing layer in contact with the exterior surface of the target backing tube, the backing layer being electrically conductive and thermally non-conductive;
- a plurality of target cylinders located around the target backing tube and in contact with the backing layer;
- a drive system for rotating the target backing tube;
- a magnet system located inside the target backing tube, the magnet system configure to maintain an enhanced sputter plasma;
- and
- a cooling system for cooling the target backing tube and the magnet system.
4 more elements
26 A rotatable magnetron system comprising:
- a target backing tube having an exterior surface;
- a backing layer in contact with the exterior surface of the target backing tube, the backing layer being electrically conductive and thermally non-conductive;
- a plurality of target cylinders located around the target backing tube and in contact with the backing layer;
- a drive system for rotating the target backing tube;
- a magnet system located inside the target backing tube, the magnet system configure to maintain an enhanced sputter plasma;
- and
- a cooling system for cooling the target backing tube and the magnet system.
4 more elements
Dependencies are inferred from the claim text.