Vaporizer
AssigneeTokyo Electron Limited
InventorsTsuneyuki Okabe, Shigeyuki Okura
Life of this patent
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Abstract
A vaporizer for generating a process gas from a gas-liquid mixture fluid includes a container defining a process space of the vaporizer. A supply head having a plurality of spray holes to spray the fluid is disposed within the container. A heating passage is disposed below the spray holes within the container. The heating passage is configured to heat the fluid passing therethrough and thereby generate the process gas. A gas delivery passage is connected to the container to laterally deliver the process gas from below the heating passage. A mist receiver is provided at the container below the gas delivery passage.
Claims20
A vaporizer for generating a process gas from a gas-liquid mixture fluid, the vaporizer comprising:
- a container defining a process space of the vaporizer;
- a supply head having a plurality of spray holes to spray the fluid within the container;
- a heating passage disposed below the spray holes within the container, the heating passage being configured to heat the fluid passing therethrough and thereby generate the process gas;
- a gas delivery passage connected to the container to laterally deliver the process gas from below the heating passage;
- and
- a mist receiver provided at the container below the gas delivery passage.
A gas generating apparatus for generating a process gas from a liquid material, the apparatus comprising:
- a pre-treatment unit configured to generate a gas-liquid mixture fluid from the liquid material;
- and
- a vaporizer to which the fluid is supplied from the pre-treatment unit through a fluid supply passage,
- wherein the vaporizer comprises
- a container defining a process space of the vaporizer,
- a supply head connected to the fluid supply passage and having a plurality of spray holes to spray the fluid within the container,
- a heating passage disposed below the spray holes within the container, the heating passage being configured to heat the fluid passing therethrough and thereby generate the process gas,
- a gas delivery passage connected to the container to laterally deliver the process gas from below the heating passage, and
- a mist receiver provided at the container below the gas delivery passage.
A semiconductor processing system comprising:
- a process chamber configured to accommodate a target substrate;
- a support member configured to support the target substrate inside the process chamber;
- a heater configured to heat the target substrate inside the process chamber;
- an exhaust system configured to exhaust gas inside the process chamber;
- a gas supply system configured to supply a process gas into the process chamber, and including a gas generating apparatus for generating the process gas from a liquid material,
- wherein the gas generating apparatus comprises
- a pre-treatment unit configured to generate a gas-liquid mixture fluid from the liquid material, and
- a vaporizer to which the fluid is supplied from the pre-treatment unit through a fluid supply passage,
- wherein the vaporizer comprises
- a container defining a process space of the vaporizer,
- a supply head connected to the fluid supply passage and having a plurality of spray holes to spray the fluid within the container,
- a heating passage disposed below the spray holes within the container, the heating passage being configured to heat the fluid passing therethrough and thereby generate the process gas,
- a gas delivery passage connected to the container to laterally deliver the process gas from below the heating passage, and
- a mist receiver provided at the container below the gas delivery passage.
Dependencies are inferred from the claim text.