Applicability improver for photosensitive resin composition and photosensitive resin composition containing the same

Abstract

To solve simultaneously the problems of scale-shaped unevenness (scale unevenness) and a raise (bead) in the edge of a substrate coming into existence upon application of a photosensitive resin composition onto particularly a large-size substrate, a silicone oil represented by the general formula (1) below is incorporated into a photosensitive resin composition containing an alkali-soluble resin such as novolak resin and a photosensitizer having a quinonediazide group in an amount of 50 to 5,000 ppm based on the total solids content of a photosensitive resin composition. Wherein R1, R2, R3, R4, R5 and R6 independently represent a hydrogen atom, a hydroxyl group, a C1-4 alkyl group or an aryl group, m is an integer of 1 to 40, and n is an integer of 1 to 40.

Dependencies are inferred from the claim text.