Radiation sensitive compositions and methods
AssigneeShipley Company, L.L.C.
InventorsJames Thackeray, Angelo Lamola
Life of this patent
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AssigneeShipley Company, L.L.C.
InventorsJames Thackeray, Angelo Lamola
Estimating the term…
The present invention provides radiation sensitive compositions and methods that comprise novel means for providing relief images of enhanced resolution. In one aspect the invention provides a method for controlling diffusion of photogenerated acid comprising adding a polar compound to a radiation sensitive composition and applying a layer of the composition to a substrate; exposing the composition layer to activating radiation whereby a latent image is generated comprising a distribution of acid moieties complexed with the polar compound; and treating the exposed composition layer to provide an activating amount of acid.
1-40. (canceled)
A chemically-amplified positive tone photoresist, the photoresist comprising:
Dependencies are inferred from the claim text.