Inspection system and inspection method for pattern profile
OwnerTakema Ito, Hiroyuki Morinagainventors
Life of this patent
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Abstract
An inspection system includes a microscope configured to observe a mask pattern of a photomask and a projected image of the mask pattern on a substrate, a circuit data memory configured to store design data of a circuit pattern to be formed on the substrate by the mask pattern, a file generator configured to generate a coordinate file regarding the design data, the observed mask pattern, and the observed projected image, and an image interface configured to display same coordinates of the design data, the observed mask pattern, and the observed projected image based on the coordinates file.
Claims20
An inspection system comprising:
- a microscope configured to observe a mask pattern of a photomask and a projected image of the mask pattern on a substrate;
- a circuit data memory configured to store design data of a circuit pattern to be formed on the substrate by the mask pattern;
- a file generator configured to generate a coordinate file regarding the design data, the observed mask pattern, and the observed projected image;
- and
- an image interface configured to display same coordinates of the design data, the observed mask pattern, and the observed projected image based on the coordinates file.
An inspection method for pattern profile including:
- observing a mask pattern of a photomask and a projected image of the mask pattern on a substrate;
- obtaining design data of a circuit pattern to be formed on the substrate by the mask pattern;
- generating a coordinate file regarding the design data, the observed mask pattern, and the observed projected image;
- and
- displaying same coordinates of the design data, the observed mask pattern, and the observed projected image based on the coordinates file to inspect a difference among the design data, the observed mask pattern, and the observed projected image.
Dependencies are inferred from the claim text.