Back to results
US 2006/0051683 A1Published application
Method of manufacturing mask for exposure, mask for exposure, and package body of mask for exposure
AssigneeFujitsu Limited
InventorYukihiro Sato
Life of this patent
Estimating the term…
Abstract
There are provided a method of manufacturing a mask for exposure, which includes the step of patterning a light-shielding film formed on a quartz substrate to form a light-shielding pattern, and the step of directly measuring a step from the surface of the quartz substrate to the top surface of the light-shielding pattern to obtain the actual measurement value of the step.
Claims15
A method of manufacturing a mask for exposure, comprising the steps of:
- patterning a light-shielding film formed on a transparent substrate to form a light-shielding pattern;
- and
- measuring a step from the surface of said transparent substrate to the top surface of said light-shielding pattern to obtain the actual measurement value of the step.
A mask for exposure, comprising:
- a transparent substrate;
- a light-shielding pattern formed in a device region on which a device pattern is projected, on said transparent substrate;
- and
- an isolated pattern formed in the peripheral region of said device region, on said transparent substrate.
1 more element
A package body of a mask for exposure, comprising:
- a mask for exposure in which the light-shielding pattern is formed on a transparent substrate;
- and
- an inspection result card on which the actual measurement value of a step from the surface of said transparent substrate to the top surface of said light-shielding pattern is written.
Dependencies are inferred from the claim text.