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US 2006/0051508 A1Published application
Focused ion beam deposition
OwnerIlan Gavish, Yuval Greenzweiginventors
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Abstract
Introducing at least one metal such as cobalt, molybdenum, metal carbonyl, tungsten, platinum, or other suitable metal into a chamber containing a substrate. Contacting the substrate with a focused ion beam introduced into the chamber. Forming at least one layer over the substrate. Applying heat to the layer by, for example, a laser.
Claims19
A method comprising:
- introducing at least one metal precursor into a chamber containing a substrate;
- contacting the substrate with a focused ion beam introduced into the chamber;
- forming a metal layer on the substrate;
- and
- applying heat to the metal layer.
2 more elements
A method comprising:
- introducing a precursor comprising one of cobalt, molybdenum, platinum, and tungsten into a chamber containing a substrate;
- contacting the substrate with a focused ion beam;
- forming a metal layer on the substrate;
- heating the metal layer;
- and
- removing one of carbon, oxygen, and gallium from the metal layer.
3 more elements
A method comprising:
- introducing at least one metal precursor into a chamber containing a substrate;
- contacting the substrate with a focused ion beam into the chamber;
- forming a metal layer on the substrate;
- and
- lowering a resistance of the metal layer.
2 more elements
Dependencies are inferred from the claim text.