Liquid immersion optical tool, method for cleaning liquid immersion optical tool, and method for manufacturing semiconductor device

A cleaning method in the liquid immersion optical tool comprising a light source;

• an optical lens system;
• a stage which moves an object base on which an object is to be placed;
• a head comprising a liquid immersion medium fluid supply device and a liquid immersion medium fluid discharge device to provide a layer of liquid immersion medium fluid between the optical lens system and the object;
• a fence which limits a region of the layer of liquid immersion medium fluid;
• and a cleaning device which cleans a portion having been contacted with the liquid immersion medium fluid by means of a cleaning solution,
• wherein the portion having been contacted with the liquid immersion medium fluid is cleaned for a predetermined time by means of the cleaning device.

A semiconductor device manufacturing method in which a semiconductor device is manufactured by using a liquid immersion exposure tool, the liquid immersion exposure tool comprising:

• a light source;
• an optical lens system;
• a stage which moves an object base on which an object is to be placed;
• a head comprising a liquid immersion medium fluid supply device and a liquid immersion medium fluid discharge device to provide a layer of liquid immersion medium fluid between the optical lens system and the object;
• a fence which limits a region of the layer of liquid immersion medium fluid;
• and
• a cleaning device which cleans a portion having been contacted with the liquid immersion medium fluid by means of a cleaning solution.