Exposure apparatus, exposure method, and device manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorYuichi Takamura
Life of this patent
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Abstract
An exposure apparatus is provided which has an optical system for projecting a pattern of an original onto a substrate and projects the pattern onto the substrate with a space between the optical system and the substrate filled with liquid. The apparatus includes a supply unit, having a nozzle, to supply liquid into the space through the nozzle, and a suppressing unit to suppress leakage of liquid from the nozzle.
Claims19
An exposure apparatus which has an optical system for projecting a pattern of an original onto a substrate and projects the pattern onto the substrate with a space between said optical system and the substrate filled with liquid, said apparatus comprising:
- a supply unit, having a nozzle, to supply liquid into the space through said nozzle;
- and
- a suppressing unit to suppress leakage of liquid from said nozzle.
A method of projecting a pattern of an original onto a substrate with a space between an optical system for projecting the pattern onto the substrate and the substrate filled with liquid, said method comprising steps of:
- supplying liquid into the space through a nozzle;
- and
- suppressing leakage of liquid from the nozzle.
Dependencies are inferred from the claim text.