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AssigneeASML Netherlands B.V.
InventorsKoen Maria Zaal, Edwin Buis, Henrikus Cox, Noud Gilissen, Harmen Schoot
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A substrate or a patterning device used in a lithographic apparatus and a lithographic device manufacturing method are presented. The substrate and patterning device are aligned with respect to a patterning beam and are movably supported by a support. Resonances in said support, however, may render the manufactured device unusable and/ or may render the control system complex. Therefore an actuator assembly frame with flexible coupling devices coupled to the support is provided with a number of actuators configured to move the support in a number of degrees of freedom. Thus, the resonances are damped by the flexible coupling devices resulting in a larger bandwidth for the control system and thus enabling a better position accuracy of the support.
A lithographic apparatus comprising:
An apparatus comprising an actuator assembly constructed to support and move an object, the actuator assembly comprising:
A device manufacturing method comprising:
Dependencies are inferred from the claim text.