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US 2006/0040216 A1Published application
Method of patterning photoresist film
AssigneeDongbuAnam Semiconductor Inc.
InventorIl Ho Lee
Life of this patent
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Abstract
A method for patterning a photoresist film provided on a substrate can include exposing the photoresist film, and developing the photoresist film with a developer including a thinner. The method can also include exposing the photoresist film, developing the photoresist film, and cleaning the photoresist film with a cleaning solution including a thinner.
Claims17
A method for patterning a photoresist film provided on a substrate, comprising:
- exposing the photoresist film;
- and
- developing the photoresist film with a developer including a thinner.
A method for patterning a photoresist film provided on a substrate, comprising:
- exposing the photoresist film;
- developing the photoresist film;
- and
- cleaning the photoresist film with a cleaning solution including a thinner.
1 more element
A method for patterning a photoresist film provided on a substrate, comprising:
- step for exposing the photoresist film;
- step for developing the photoresist film;
- and
- step for cleaning the photoresist film,
- wherein at least one of the step for developing and the step for cleaning uses a solution including a thinner.
2 more elements
Dependencies are inferred from the claim text.