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US 2006/0040208 A1Published application
Chemical amplification resist composition and pattern-forming method using the same
AssigneeFuji Photo Film Co., Ltd.
InventorsShinji Tarutani, Hyou Takahashi, Kenji Wada
Life of this patent
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Abstract
A chemical amplification resist composition comprising (A) a resin increasing the solubility in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation, (C) a compound having a fluorine atom and a hydroxyl group, and a pKa value of from 4 to 15, and (D) a solvent, and a pattern-forming method using the same.
Claims9
A chemical amplification resist composition comprising:
- (A) a resin increasing the solubility in an alkali developer by the action of an acid;
- (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation;
- (C) a compound having a fluorine atom and a hydroxyl group, and a pKa value of from 4 to 15;
- and (D) a solvent.
1 more element
Dependencies are inferred from the claim text.