Pattern measuring method, pattern measuring apparatus, photo mask manufacturing method, semiconductor device manufacturing method, and computer program product
OwnerShigeki Nojima, Hiroshi Motoki +3inventors
InventorsShigeki Nojima, Hiroshi Motoki, Takahiro Ikeda, Satoshi Tanaka, Takeshi Ito
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Abstract
A pattern measuring method includes preparing a substrate comprising a pattern, extracting a place to be measured on the substrate based on a simulation using pattern data relating to the pattern as input data, generating measurement information for measuring a physical quantity of the place to be measured by a measuring apparatus, and measuring the place to be measured based on the measurement information by the measuring apparatus.
Claims20
A pattern measuring method comprising:
- preparing a substrate comprising a pattern;
- extracting a place to be measured on the substrate based on a simulation using pattern data relating to the pattern as input data;
- generating measurement information for measuring a physical quantity of the place to be measured by a measuring apparatus;
- and
- measuring the place to be measured based on the measurement information by the measuring apparatus.
A pattern measuring apparatus comprising:
- an extraction unit configured to extract a place to be measured on a substrate comprising a pattern, the extraction unit including an extraction section configured to extract the place to be measured based on a simulation using pattern data relating to the pattern as input data;
- a generation unit configured to generate measurement information for measuring a physical quantity of the place to be measured;
- and
- a measurement unit configured to measure the place to be measured based on the measurement information.
A computer program product configured to store program instructions for execution on a computer system enabling the computer system to perform:
- an instruction to read data relating a substrate comprising a pattern;
- an instruction to extract a place to be measured on the substrate based on a simulation using pattern data relating to the pattern as input data;
- an instruction to generate measurement information for measuring a physical quantity of the place to be measured by a measuring apparatus;
- and
- an instruction to measure the place to be measured based on the measurement information by the measuring apparatus.
Dependencies are inferred from the claim text.