Substrate inspection apparatus and method

A substrate examining device comprising;

• a sample stage configured so as to be movable;
• a conveying device for conveying a sample to be measured to the sample stage;
• an optical microscope for observing a measurement point on the sample to be measured on the sample stage;
• a Raman spectroscopy optical system for irradiating a laser light to the measurement point of the optical microscope and outputting information relating to the sample to be measured;
• and
• an arithmetic processing unit for analyzing and outputting stress and/or strain at the measurement point using the obtained information.

A method of examining a semiconductor substrate with strain silicon deposited for increased carrier mobility, comprising;

• a semiconductor substrate for examination;
• determining a measurement point as an initial position for examination;
• irradiating polarized light of a plurality of different wavelengths to the measurement point and detecting first output signals from the polarized light by an ellipsometer measurement system;
• irradiating laser light of a predetermined wavelength to the measurement point and detecting second output signals from the laser light by a Raman spectroscopy measurement system;
• and
• processing the first output signals and the second output signals to determine the suitability of the semiconductor substrate.