Patterned mask holding device and method using two holding systems
AssigneeASML Holding N.V.
InventorDaniel Galburt
Life of this patent
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Abstract
A system and method that eliminate or substantially reduce slippage of a pattern generator with respect to a pattern generator holding device during a scanning portion of an exposure operation. In first and second examples, this is done by either (a) continuously or (b) when needed concurrently using first and second pattern generator holding systems to hold the pattern generator to the pattern generator holding device. In these examples, the first pattern generator holding systems utilizes an electrostatic system to attract the pattern generator to the pattern generator holding device and the second pattern generator holding system utilizes a vacuum system to attract the pattern generator to the pattern generator holding device.
Claims22
A system, comprising,
- a patterned mask holding device;
- a first patterned mask holding system coupled to the patterned mask holding device that releasably couples a patterned mask to the patterned mask holding device;
- a second patterned mask holding system coupled to the patterned mask holding device, the second patterned mask holding system operating concurrently with the first patterned mask holding system to releasably couple the patterned mask to the patterned mask holding device;
- and
- a moving device couple to the patterned mask holding device that moves the patterned mask holding device and the patterned mask during a scanning portion of a exposure operation.
A system, comprising,
- a patterned mask holding device that holds a patterned mask;
- a monitoring system that monitors slippage of the patterned mask with respect to the patterned mask holding device during movement of the patterned mask holding device, the monitoring system producing a result signal when the slippage is detected;
- a first patterned mask holding system coupled to the patterned mask holding device that releasably couples the patterned mask to the patterned mask holding device;
- a second patterned mask holding system coupled to the patterned mask holding device that releasably couples the patterned mask to the patterned mask holding device;
- and
- a controller that enables one or both of the first or second patterned mask holding systems based on receiving the result signal.
A method, comprising:
- (a) holding a patterned mask to a patterned mask holding device using a first holding system;
- and
- (b) holding the patterned mask to the patterned mask holding device using a second holding system concurrently with step (a), while a moving device is moving the patterned mask holding device and the patterned mask during a scanning portion of an exposure operation.
Dependencies are inferred from the claim text.