US 2006/0038968 A1 · Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

AssigneeASML Netherlands B.V.

InventorsNicolaas Kemper, Henrikus Marie Cox, Sjoerd Nicolaas Donders, Roelof Frederick De Graaf, Christiaan Alexander Hoogendam, Nicolaas Kate, Jeroen Johannes Sophia Mertens, Frits Der Meulen, Franciscus Herman Maria Teunissen, Jan-Gerard Van Der Toorn, Martinus Cornelis Verhagen, Stefan Belfroid, Johannes Smeulers

Life of this patent

Estimating the term…

Abstract

A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

Claims24

Dependent claims

A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate using a projection system and having a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate, comprising a liquid removal system including:

a conduit having an open end adjacent a volume in which liquid will be present;
a porous member between the end of the conduit and the volume;
and
a suction device arranged to create a pressure differential across the porous member.

1 more element

Dependencies are inferred from the claim text.

Facts

Application

10/921,348Filed 19 Aug 2004

Published

23 Feb 2006

Term ends

Not estimatedThe source records don’t support an estimate.

Classification6 codes

G03F 7/70883
Environment aspects, e.g. pressure of beam-path gas, temperature: of optical system
G03F 7/70341
Mask projection systems: details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
G03F 7/70858
Construction of apparatus, e.g. environment aspects, hygiene aspects or materials: environment aspects, e.g. pressure of beam-path gas, temperature
G03F 7/70866
Environment aspects, e.g. pressure of beam-path gas, temperature: of mask or workpiece