Charged particle beam apparatus and method of forming electrodes having narrow gap therebetween by using the same
AssigneeRiken & SII NanoTechnology Inc.
InventorsToshiaki Fujii, Masao Abe, Kunji Shigeto, Minuru Kawamura, Alekber Kasumov, Kazuhito Tsukagoshi, Yoshinobu Aoyagi
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