Pixel structure and fabricating method thereof

A method of fabricating a pixel structure, comprising

• sequentially forming a gate electrode a gate line and a common line on a substrate, wherein the gate line is electrically connected to said gate electrode;
• forming a gate insulating layer on said substrate to cover said gate electrode, said gate line and said common line;
• forming a channel layer above said gate insulating layer and said gate electrode;
• forming a data line and a conducting layer on said gate insulating layer and forming a source electrode and a drain electrode on said channel layer, said data line being electrically connected to said source electrode, said conducting layer including a coupling portion and a connecting portion, said coupling portion being formed above said common line, said connecting portion connecting said coupling portion and said drain electrode;
• forming a passivation layer above said substrate covering said data line, said conducting layer and said thin film transistor;
• forming a contact window in said passivation layer exposing said connecting portion;
• and
• forming a pixel electrode on said passivation layer, said pixel electrode being electrically connected to said conducting layer through said contact window.