Sputtering cathode adapter assembly and method
AssigneeTokyo Electron Limited
InventorsJohn Lawson, Dale Irwin, Steve Chervenak, John McIntee
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AssigneeTokyo Electron Limited
InventorsJohn Lawson, Dale Irwin, Steve Chervenak, John McIntee
Estimating the term…
An adapter assembly is provided for supporting a sputtering cathode in a fixed opening in the chamber of a sputter coating machine. The assembly includes: one of several adapter bodies, each configured to support, in the fixed opening, a target of one of a plurality of sizes and types, and at one of several target-to-substrate spacings; one of several insulator rings, each for a target of a different size or type; one of several dark-space shields, each for a target of a different size, type, material, or processing pressure; and one of several adapter shields, each for a different adapter body and target material. Only the shields accumulate deposits and require cleaning or replacement. The dark-space shield is spaced from the target rim by a gap of at 0.045 to 0.067 inches to form a deep narrow space that prevents deposits onto the insulator ring while avoiding arcing and plasma formation in the gap. A method is provided for existing sputtering machines with the assembly, which accommodates different targets and processes.
An adapter body comprising:
An insulator comprising:
A dark space shield comprising:
An adapter shield comprising:
Dependencies are inferred from the claim text.