Reducing electrostatic charge by roughening the susceptor
AssigneeApplied Materials, Inc.
InventorsSoo Choi, Beom Park, Quanyuan Shang, John White, Dong-Kil Yim, Chung-Hee Park
Life of this patent
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AssigneeApplied Materials, Inc.
InventorsSoo Choi, Beom Park, Quanyuan Shang, John White, Dong-Kil Yim, Chung-Hee Park
Estimating the term…
A substrate support and method for fabricating the same are provided. In one embodiment of the invention, a substrate support includes an electrically conductive body having a substrate support surface that is covered by an electrically insulative coating. At least a portion of the coating centered on the substrate support surface has a surface finish of between about 200 to about 2000 micro-inches. In another embodiment, a substrate support includes an anodized aluminum body having a surface finish on the portion of the body adapted to support a substrate thereon of between about 200 to about 2000 micro-inches. In one embodiment, a substrate support assembly includes an electrically conductive body having a substrate support surface, a substrate support structure that is adapted to support the conductive body and the conductive body is covered by an electrically insulative coating.
A substrate support adapted to support large area substrates comprising:
A substrate support adapted to support large area substrates comprising:
A substrate support fabricated by a process comprising:
A substrate support fabricated by the process comprising:
A substrate support adapted to support large area substrates comprising:
A substrate support adapted to support large area substrates comprising:
Dependencies are inferred from the claim text.