Method of manufacturing polishing slurry for use in precise polishing process

Abstract

An abrasive and a dispersion medium are introduced into a dispersing machine to uniformly disperse the abrasive. The liquid to be processed after dispersion is centrifugally classified by a centrifugal classifier to remove heavy particles which will cause scratches. Chemicals are added to the liquid to be processed after classification to make adjustments on a variety of properties such as the concentration, pH, and the like. The polishing slurry after adjustment for a desired composition is filtered by a filter to remove debris therefrom. The filter may have a mesh size large enough to allow particles of the abrasive to pass therethrough.

Dependencies are inferred from the claim text.