Composite patterning devices for soft lithography

A composite patterning device for generating a pattern on a substrate surface, said device comprising:

• a first layer comprising a three-dimensional relief pattern having at least one contact surface disposed thereon, said first layer having a low Young's modulus and having an internal surface opposite said contact surface;
• a second layer having an internal surface and an external surface;
• said second layer having a high Young's modulus;
• and
• a third layer having an internal surface and an external surface;
• wherein said first, second and third polymer layers are arranged such that a force applied to the external surface of said third polymer layer is transmitted to said first polymer layer;
• and
• wherein the thicknesses and thermal expansion coefficients of said first and third layers are selected to provide a substantially symmetrical distribution of the coefficients of thermal expansion about the center of said patterning device along a layer alignment axis extending through said patterning device, and wherein said composite patterning device is capable of establishing conformal contact between at least a portion of said contact surface of said first layer and said substrate surface.

A method of generating a pattern on a substrate surface, said method comprising the steps of:

• providing a composite patterning device comprising:
• a first polymer layer comprising a three-dimensional relief pattern having at least one contact surface disposed thereon, said first polymer layer having a low Young's modulus and having a internal surface opposite said contact surface;
• and
• a second polymer layer having an internal surface and an external surface;
• said second polymer layer having a high Young's modulus;
• wherein said first polymer layer and said second polymer layer are arranged such that a force applied to the external surface of said second polymer layer is transmitted to said first polymer layer;
• depositing a transfer material onto said contact surface of said first polymer layer, thereby generating a layer of transfer material on the contact surface;
• contacting said composite patterning device and said substrate surface in a manner establishing conformal contact between at least a portion of said contact surface and said substrate surface, wherein said layer of transfer material is exposed to said substrate surface;
• and
• separating said composite patterning device and said substrate surface, thereby transferring at least a portion of said transfer material to said substrate surface and generating said pattern on said substrate surface.

A method of generating a pattern on a substrate surface, said method comprising the steps of:

• providing a composite patterning device comprising:
• a first polymer layer comprising a three-dimensional relief pattern having at least one contact surface disposed thereon, said first polymer layer having a low Young's modulus and having a internal surface opposite said contact surface;
• and
• a second polymer layer having an internal surface and an external surface;
• said second polymer layer having a high Young's modulus;
• wherein said first polymer layer and said second polymer layer are arranged such that a force applied to the external surface of said second polymer layer is transmitted to said first polymer layer;
• contacting said composite patterning device and said substrate surface in a manner establishing conformal contact between at least a portion of said contact surface and said substrate surface, thereby generating a mold comprising the space separating said three-dimensional relief pattern and said substrate surface;
• introducing a transfer material into said mold;
• and
• separating said composite patterning device and said substrate surface, thereby generating said pattern on said substrate surface.

A method of generating a pattern on the surface of a substrate comprising a photosensitive material, said method comprising the steps of:

• providing a composite patterning device comprising:
• a first polymer layer comprising a three-dimensional relief pattern having at least one contact surface disposed thereon, said first polymer layer having a low Young's modulus and having a internal surface opposite said contact surface;
• and
• a second polymer layer having an internal surface and an external surface;
• said second polymer layer having a high Young's modulus;
• wherein said first polymer layer and said second polymer layer are arranged such that a force applied to the external surface of said second polymer layer is transmitted to said first polymer layer;
• contacting said composite patterning device and said surface of said substrate in a manner establishing conformal contact between at least a portion of said contact surface and said surface of said substrate;
• and
• directing electromagnetic radiation through said composite patterning device and onto said surface of said substrate, thereby generating a pattern of electromagnetic radiation having a selected two-dimensional distribution of intensities on said substrate surface;
• wherein interaction of said electromagnetic radiation and said radiation sensitive material generates chemically modified regions of said radiation sensitive material, thereby generating said pattern on said substrate surface.

A method of making a composite patterning device, said method comprising the steps of:

• providing a master relief pattern having a selected three-dimensional relief pattern;
• contacting said master relief pattern with a prepolymer of a low modulus polymer;
• contacting said prepolymer material with an high modulus polymer layer;
• polymerizing said prepolymer, thereby generating a low modulus polymer layer in contact with said high modulus polymer layer and in contact with said master relief pattern;
• said low modulus polymer layer having a three-dimensional relief pattern;
• and
• separating said low modulus polymer layer from said master relief pattern, thereby making said composite pattering device.

A fiber reinforced composite patterning device for generating a pattern on a substrate surface, said device comprising:

• a first polymer layer comprising a three-dimensional relief pattern having at least one contact surface disposed thereon, said first polymer layer having a low Young's modulus and having an internal surface opposite said contact surface;
• and
• a second polymer layer having an internal surface and an external surface;
• said second polymer layer comprising an array of fibers in a polymer, wherein said internal surface of said second polymer layer is in contact with said external surface of said first polymer layer;
• a third polymer layer having an internal surface and an external surface;
• said third polymer layer comprising an mesh of fibers in a polymer, wherein said internal surface of said third polymer layer is in contact with said external surface of said second polymer layer;
• a fourth polymer layer having an internal surface and an external surface;
• said fourth polymer layer comprising an mesh of fibers in a polymer, wherein said internal surface of said fourth polymer layer is in contact with said external surface of said third polymer layer;
• a fifth polymer layer having an internal surface and an external surface;
• said fifth polymer layer comprising an array of fibers in a polymer, wherein said internal surface of said fifth polymer layer is in contact with said external surface of said fourth polymer layer;
• wherein said composite patterning device is capable of establishing conformal contact between at least a portion of said contact surface of said first polymer layer and said substrate surface.

An alignment system for aligning a conformable patterning device and a substrate, said system comprising:

• said conformable patterning device comprising a first polymer layer having a contact surface with a first alignment element, said first polymer layer having a low Young's modulus, said first alignment element comprising either a recessed region or a relief feature;
• said substrate having an external surface;
• wherein said external surface comprises a second alignment element comprising either a recessed region or a relief feature that is complementary to said first alignment element;
• a patterning agent present between said contact surface of said conformable patterning device and said external surface of said substrate;
• wherein said contact surface is capable of establishing conformal contact with said external surface such that said first and second alignment features engage.

A method of aligning a conformable patterning device and a substrate, said method comprising:

• providing said conformable patterning device comprising a first polymer layer having a contact surface with a first alignment element, said first polymer layer having a low Young's modulus, said first alignment element comprising either a recessed region or a relief feature;
• providing said substrate having an external surface;
• wherein said external surface comprises a second alignment element comprising either a recessed region or a relief feature that is complementary to said first alignment element;
• providing a patterning agent between said contact surface of said conformable patterning device and said external surface of said substrate;
• and
• establishing conformal contact between said contact surface and said external surface such that said first and second alignment features engage.