Substrate with a multilayer reflection film, reflection type mask blank for exposure, reflection type mask for exposure and methods of manufacturing them

A multilayer-reflection-film-coated substrate having a multilayer reflection film formed on a substrate for reflecting exposure light, wherein:

• a conductive film is formed on an opposite side of the substrate from the multilayer reflection film;
• the conductive film having a surface comprising a metal nitride film containing substantially no oxygen (O).

A multilayer-reflection-film-coated substrate having a multilayer reflection film formed on a substrate for reflecting exposure light, wherein:

• a conductive film made of a material containing metal is formed on an opposite side of the substrate from the multilayer reflection film;
• the material forming the conductive film having different compositions in a film thickness direction of the conductive film;
• the conductive film containing nitrogen (N) on a substrate side and at least one of oxygen (O) and carbon (C) on a surface side.

A method of manufacturing a multilayer-reflection-film-coated substrate, the method comprising the steps of preparing a conductive-film-coated substrate comprising a substrate and a conductive film formed on the substrate in a region excluding at least a peripheral portion thereof;

• holding the conductive-film-coated substrate by an electrostatic chuck on the side provided with the conductive film;
• and forming a multilayer reflection film for reflecting exposure light on an opposite side of the substrate from the conductive film.