Heterocycle-bearing onium salts
AssigneeWako Pure Chemical Industries, Ltd.
InventorsMasami Ishihara, Yoji Urano, Masahiro Takahashi
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AssigneeWako Pure Chemical Industries, Ltd.
InventorsMasami Ishihara, Yoji Urano, Masahiro Takahashi
Estimating the term…
The present invention relates to a heterocycle-containing onium salt useful as, for example, a cationic photopolymerization initiator and an acid generator for a chemically amplified resist, and provides “a heterocycle-containing onium salt shown by the general formula [1]: [wherein R is a group shown by the general formula [2]: (wherein R3 and R4 are each independently a halogen atom, an alkyl group which may have a halogen atom or an aryl group as a substituent, or an aryl group which may have a halogen atom or a lower alkyl group as a substituent; X2 is an oxygen atom or a sulfur atom; i is an integer of 0 to 4; and j is an integer of 0 to 3), or a group shown by the general formula [3]: (wherein R5 and R6 are each independently a halogen atom, an alkyl group which may have a halogen atom or an aryl group as a substituent, or an aryl group which may have a halogen atom or a lower alkyl group as a substituent; X3 and X4 are each independently an oxygen atom or a sulfur atom; p is an integer of 0 to 2; and q is an integer of 0 to 3); R1 and R2 are each independently a halogen atom, an alkyl group which may have a halogen atom or an aryl group as a substituent, or an aryl group which may have a halogen atom or a lower alkyl group as a substituent; m and n are each independently an integer of 0 to 5; and A is a halogen atom or an anion derived from an inorganic strong acid, an organic acid or a compound shown by the general formula [4]: HM1(R7)4 [4] (wherein M1 is a boron atom or a gallium atom; and R7 is an aryl group which may have a substituent selected from a lower haloalkyl group, a halogen atom, a nitro group and a cyano group)]” or “a heterocycle-containing onium salt shown by the general formula [35]: [wherein R26 and R27 are each independently an aryl group which may have a halogen atom or a lower alkyl group as a substituent, a group shown by the above-mentioned general formula [2], or a group shown by the above-mentioned general formula [3]; and A3 is a halogen atom or an anion derived from an inorganic strong acid, an organic acid or a compound shown by the general formula [4]; and provided that at least one of R26 and R27 is a group shown by the above-mentioned general formula [2] or [3], and when only one of R26 and R27 is a group shown by the above-mentioned general formula [2] or [3], A3 is an anion derived from an inorganic strong acid shown by the general formula [36]; HM3F6 [36] (wherein M3 is a phosphorus atom, an arsenic atom or an antimony atom), an organic acid or a compound shown by the general formula [4]]”.
A heterocycle-containing onium salt shown by the general formula [1] or [35]:
A cationic photopolymerization initiator comprising a heterocycle-containing onium salt shown by the general formula [8]:
A cationic photopolymerization initiator comprising a heterocycle-containing iodonium salt shown by the general formula [37]:
An acid generator for a resist, comprising a sulfonium salt shown by the general formula [9]:
An acid generator for a resist, comprising an iodonium salt shown by the general formula [38]:
Dependencies are inferred from the claim text.