System and method for forming multi-component dielectric films
AssigneeAviza Technology, Inc.
InventorsYoshihide Senzaki, Seung Park
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Abstract
The present invention provides systems and methods for mixing precursors such that a mixture of precursors are present together in a chamber during a single pulse step in an atomic layer deposition (ALD) process to form a multi-component film. The precursors are comprised of at least one different chemical component, and such different components will form a mono-layer to produce a multi-component film. In a further aspect of the present invention, a dielectric film having a composition gradient is provided.
Claims21
A method of forming a film on a surface of a substrate, characterized in that:
- two or more precursors, each of the precursors containing at least one different chemical component, are conveyed to a process chamber together and form a mono-layer on the surface of the substrate, said mono-layer containing each of the separate chemical components, said process chamber being configured to house a plurality of substrates.
A method for forming a multi-component film on a surface of a substrate comprising the steps of:
- vaporizing two or more precursors, each of the precursors containing at least one metal or metalloid component;
- conveying the two or more precursors into a process chamber configured to house a plurality of substrates, wherein the precursors are present together in the process chamber;
- forming a mono-layer on the surface of the substrate, said mono-layer containing each of the metal or metalloid components;
- and
- purging said process chamber.
A system for atomic layer deposition comprising:
- at least a first vaporizer containing a first deposition precursor for deposition;
- a least a second vaporizer containing a second deposition precursor for deposition;
- a process chamber configured to house a plurality of substrates and adapted to carry out an atomic layer deposition process;
- and
- a manifold, said manifold being coupled to said first and second vaporizers and to said process chamber, said manifold being adapted to mix and convey the first and second deposition precursors to said process chamber.
A method of forming a film on the surface of a substrate, characterized in that:
- two or more precursors, each of the precursors containing at least one different chemical component, are conveyed to a process chamber together and form a mono-layer on the surface of the substrate, said process chamber being configured to house a plurality of substrates and wherein the amount of each of the precursors conveyed to the process chamber is selectively controlled such that a desired composition gradient of one of more of the chemical components is formed in the film.
Dependencies are inferred from the claim text.