Hyperboloid-drum structures and method of fabrication of the same using ion beam etching
AssigneePostech Foundation
InventorsO'Dae Kwon, Jun-Youn Kim, Sung-Jae An
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AssigneePostech Foundation
InventorsO'Dae Kwon, Jun-Youn Kim, Sung-Jae An
Estimating the term…
The present invention relates to a method of mass fabricating a hyperboloid-drum element which is uniform in size and with the diameter of an active layer (active region or gain medium) ranging from tens of nm to less than a few μm, and to an element fabricated thereby. According to the present invention, the fabrication method of the hyperboloid-drum element comprises forming an epitaxial layer which includes an n-type semiconductor joined with a p-type semiconductor on a substrate and an active region near a border region and a boundary between the n-type semiconductor and the p-type semiconductor; and etching the epitaxial layer into a shape of the hyperboloid-drum having the minimum diameter at the active region by an ion-beam etching method. The hyperboloid-drum element fabricated in accordance with the present invention has advantages of uniformity in size and good reproducibility.
A hyperboloid-drum element comprising:
A hyperboloid-drum element comprising
A fabrication method of a hyperboloid-drum element, comprising:
A fabrication method of a hyperboloid-drum element, comprising:
Dependencies are inferred from the claim text.