Manufacturing system for microstructure

A manufacturing system for a microstructure, comprising:

• pressure-contacting and separating element, provided inside a vacuum container, for pressure-contacting a pressure-contacted member having a plurality of thin film members, each having any of an arbitrary two-dimensional pattern and an arbitrary three-dimensional pattern, to a pressure-contacting target member arranged so as to face the pressure-contacted member, and for separating the thin film members toward the pressure-contacting target member;
• and
• positioning element for positioning of the pressure-contacted member and the pressure-contacting target member,
• wherein bonding portions of the pressure-contacting target member and of the thin film members are opposed to one another by the positioning element, the thin film members are pressure-contacted to the pressure-contacting target member by the pressure-contacting and separating element, and the pressure-contacting and separating element separates from the thin film members, thus laminating the thin film members on the pressure-contacting target member,
• wherein the manufacturing system for a microstructure comprises:
• surface cleaning element for irradiating any of atoms and an ion beam onto surfaces of the pressure-contacted member and the pressure-contacting target member, and
• wherein the positioning element includes:
• a first stage having a stroke enabling the first stage to travel across an entire surface of the pressure-contacted member facing the pressure-contacting target member;
• a second stage having a stroke equivalent to or greater than a range of positioning accuracy of the first stage;
• measuring element capable of measuring a position of the pressure-contacted member at high accuracy;
• and
• positioning controlling element for allowing the measuring element to measure the position of the pressure-contacted member moved by the first stage, for calculating an error correction value based on a difference between the measured position and a target position, and for moving the second stage to the target position by use of the calculated error correction value, thus correcting a positioning error of the first stage.