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AssigneeAsahi Glass Company, Limited
InventorsYasuhide Kawaguchi, Isamu Kaneko, Yoko Takebe, Shinji Okada, Osamu Yokokoji
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A resist composition which can easily form a resist pattern excellent in transparency for vacuum ultraviolet rays such as an F2 excimer laser or the like and dry etching characteristics and further excellent in sensitivity, resolution, flatness, thermal resistance and the like, is provided. The resist composition, characterized by comprising (A) a fluorine-containing polymer having an acidic group blocked with a blocking group containing a cycloalkyl group, an organic group having one or more of cycloalkyl groups, a bicycloalkyl group or the like, (B) an acid generating compound capable of generating an acid by irradiation with a light, and (C) an organic solvent.
A resist composition which comprises (A) a fluoropolymer having an acidic group, a part of the acidic group being blocked with a blocking group represented by the formula (1), (B) an acid generating compound capable of generating an acid by irradiation with a light, and (C) an organic solvent;
Dependencies are inferred from the claim text.