High density cobalt-manganese coprecipitated nickel hydroxide and process for its production
AssigneeTanaka Chemical Corporation
InventorsHiroyuki Ito, Takeshi Usui, Mamoru Shimakawa, Toyoshi Iida
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AssigneeTanaka Chemical Corporation
InventorsHiroyuki Ito, Takeshi Usui, Mamoru Shimakawa, Toyoshi Iida
Estimating the term…
The present invention provides high density cobalt-manganese coprecipitated nickel hydroxide, particularly having a tapping density of 1.5 g/cc or greater, and a process for its production characterized by continuous supply of an aqueous solution of a nickel salt which contains a cobalt salt and a manganese salt, of a complexing agent and of an alkali metal hydroxide, into a reactor either in an inert gas atmosphere or in the presence of a reducing agent, continuous crystal growth and continuous removal.
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A process for production of high density cobalt-manganese coprecipitated nickel hydroxide particles represented by the formula:
Dependencies are inferred from the claim text.