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US 2005/0089489 A1Published application
Composition for exfoliation agent effective in removing resist residues
OwnerMelvin Carterinventor
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Abstract
Improved fluoride-based compositions effective in exfoliating resist residues resulting from dry etching and plasma ashing are disclosed. An excellent anti-corrosion effect, as well as resist residue exfoliation effect, can be achieved using the disclosed compositions.
Claims18
A composition for exfoliation agent comprising:
- (a) a salt formed of hydrofluoric acid and a base containing no metal ion;
- (b) one or more water soluble organic solvents;
- (c) a sugar alcohol;
- and
- (d) water,
- wherein the pH of the composition is above 8, and the composition is effective in exfoliating resist residues.
3 more elements
A composition for exfoliation agent comprising:
- (a) a salt formed of hydrofluoric acid and a base without metal ion;
- (b) one or more water soluble organic solvents;
- (c) a sugar alcohol;
- (d) water;
- and
- (e) hydrofluoric acid,
- wherein the pH of the composition is above 8, and the composition is effective in exfoliating resist residues.
4 more elements
Dependencies are inferred from the claim text.