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US 2005/0032004 A1Published application
Method of controlling removal of photoresist in openings of a photoresist mask
AssigneeGeneral Phosphorix LLC
InventorsArkady Nikitin, Dmitriy Yeremin
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Abstract
A method of controlling removal of photoresist in openings of a photoresist mask has the steps of obtaining in a scanning electron microscope a video signal of a bottom of an opening of a photoresist mask, and comparing values of the video signal in different points of an image which contains the opening to be controlled.
Claims10
A method of controlling removal of photoresist in openings of a photoresist mask, comprising the steps of obtaining in a scanning electron microscope a video signal of a bottom of an opening of a photoresist mask;
- and comparing values of the video signal in different points of an image which contains the opening to be controlled.
Dependencies are inferred from the claim text.