Method for manufacturing micro-optical mirror arrays
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsMing-Chih Chang, Hua-Shu Wu, Tsong-Mu Lai
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Abstract
A method for producing a spheroidal shaped micro-array assembly including providing a substrate having frontside patterned openings formed in the substrate; blanket depositing a photosensitive layer over the substrate including the frontside patterned openings; exposing the photosensitive layer to ionizing radiation for a predetermined period of time to produce outgassing to separate the photosensitive layer and substrate to produce a spheroidal shaped photosensitive layer portion; blanket depositing a mirror layer over the photoresist layer to preserve the spheroidal shaped photosensitive layer portion; and removing the photosensitive layer.
Claims32
A method for producing a spheroidal shaped micro-array assembly comprising the steps of:
- providing a substrate comprising at least one frontside patterned opening formed in the substrate;
- blanket depositing a photosensitive layer over the substrate including the at least one frontside patterned opening;
- and
- exposing the photosensitive layer to ionizing radiation for a predetermined period of time to produce photosensitive layer outgassing where at least a portion of effluent gas is trapped beneath the photosensitive layer to produce a spheroidal shaped photoresist layer portion the at least one frontside patterned opening.
A method for producing a micro-optical mirror assembly component comprising the steps of:
- providing a silicon-based substrate comprising an overlying dielectric insulating layer having frontside etched openings exposing the silicon substrate;
- blanket depositing a photoresist layer over said substrate including said frontside etched openings;
- exposing said photoresist layer to ultraviolet (UV) radiation for a predetermined period of time to produce photoresist generated gas where at least a portion of said gas is trapped beneath said photoresist layer to displace said photoresist layer away from the silicon-based substrate to produce a spheroidal shaped photoresist layer portion over the frontside etched openings;
- blanket depositing at least one layer selected from the group consisting of a metal and a dielectric layer over said photoresist layer to form a reflective surface;
- etching backside openings through said silicon substrate thickness from the backside of said silicon substrate each of said backside openings encompassed by said spheroidal shaped photoresist layer portion;
- and
- removing said photoresist layer.
A method for producing a spheroidal shaped micro-array assembly comprising the steps of:
- providing a substrate comprising at least one frontside patterned opening formed in the substrate;
- blanket depositing a photosensitive layer over the substrate including the at least one frontside patterned opening;
- and
- exposing the photosensitive layer to ionizing radiation for a predetermined period of time to separate the photosensitive layer from the substrate to produce a spheroidal shaped photosensitive layer portion.
Dependencies are inferred from the claim text.